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SIOM OpenIR  > 强场激光物理国家重点实验室  > 期刊论文
题名:
Two-dimension atom nano-lithograph via atom localization
作者: Luling Jin ; Hui Sun ; Yueping Niu ; Shiqi Jin ; Shangqing Gong
刊名: J Mod. Opt.
发表日期: 2009
期: 56, 页:805
收录类别: 其他
合作性质: 其它
语种: 中文
WOS记录号: WOS:000265415700016
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.siom.ac.cn/handle/181231/6737
Appears in Collections:强场激光物理国家重点实验室_期刊论文

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Recommended Citation:
Luling Jin,Hui Sun,Yueping Niu,et al. Two-dimension atom nano-lithograph via atom localization[J]. J Mod. Opt.,2009(56):805.
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