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High contrast amplification at 1053 nm limited by pulse stretching-compressing process
Lu XM(陆效明); Peng YJ(彭宇杰); Li YY(李妍妍); Guo XY(郭晓杨); Leng YX(冷雨欣); Sui Z(隋展); Xu Y(许毅); Wang XL(王新亮); lengyuxin@mail.siom.ac.cn; lqling@vip.163.com
2016
发表期刊Chin. Opt. Lett.
卷号14期号:2
摘要We report on our high-contrast laser based on high-contrast, high-energy seed injection, low-gain optical parametric chirped pulse amplification (OPCPA), and Nd:glass amplifiers, which can be used as the high-contrast front end of a high-power Nd:glass chirped pulse amplification (CPA) laser system. The energy of the stretched 1053 nm high-contrast seed pulse increases to 60 mu J by optimizing the frequency doubling crystal in the pulse cleaning device. After passing through a two-stage low-gain OPCPA, a 2-pass 2-rod Nd:glass amplifier, and a compressor the amplified pulse of 131 mJ/282 fs is achieved. The third-order correlation scanning measurement shows that the pulse contrast in the tens of ps range is about 10(-7)-10(-8). With the high-contrast seed passing through the stretcher and compressor only, the contrast measurement indicates that the stretching-compressing process leads mainly to the contrast degradation of the amplified pulse.
文章类型Article
部门归属强光
DOI10.3788/COL201614.023201
收录类别SCI
WOS记录号WOS:000371375300020
引用统计
被引频次:11[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28629
专题强场激光物理国家重点实验室
通讯作者lengyuxin@mail.siom.ac.cn; lqling@vip.163.com
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Lu XM,Peng YJ,Li YY,et al. High contrast amplification at 1053 nm limited by pulse stretching-compressing process[J]. Chin. Opt. Lett.,2016,14(2).
APA 陆效明.,彭宇杰.,李妍妍.,郭晓杨.,冷雨欣.,...&lqling@vip.163.com.(2016).High contrast amplification at 1053 nm limited by pulse stretching-compressing process.Chin. Opt. Lett.,14(2).
MLA 陆效明,et al."High contrast amplification at 1053 nm limited by pulse stretching-compressing process".Chin. Opt. Lett. 14.2(2016).
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