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Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
Zhu, Boer; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Shen, Lina; Duan, Lifeng; wxz26267@siom.ac.cn
2016
发表期刊Appl. Optics
卷号55期号:12页码:3192
摘要A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z(5) - Z(37)) with a maximum error of less than 0.00085 lambda. (C) 2016 Optical Society of America
文章类型Article
部门归属信息光电
DOI10.1364/AO.55.003192
资助者National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129]
收录类别SCI
资助者National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] ; National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129]
WOS记录号WOS:000374388600043
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28534
专题信息光学与光电技术实验室
通讯作者wxz26267@siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Zhu, Boer,Wang, Xiangzhao,Li, Sikun,et al. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image[J]. Appl. Optics,2016,55(12):3192.
APA Zhu, Boer.,Wang, Xiangzhao.,Li, Sikun.,Yan, Guanyong.,Shen, Lina.,...&wxz26267@siom.ac.cn.(2016).Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image.Appl. Optics,55(12),3192.
MLA Zhu, Boer,et al."Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image".Appl. Optics 55.12(2016):3192.
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