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Programmable uniformity correction by using plug-in finger arrays in advanced lithography system
Cheng, Weilin; Zhang, Yunbo; Zhu, Jing; Yang, Baoxi; Zeng, Aijun; Huang, Huijie; huanghuijie@siom.ac.cn
2017
发表期刊Opt. Commun.
卷号392页码:77
摘要Illumination integrated non-uniformity (IINU) is one of the key factors to determine the resolution and Critical Dimension Uniformity (CDU) which are important performance parameters in advanced lithography system. To further reduce the IINU, uniformity correction technology has been adopted. In this paper, an approach of programmable uniformity correction with higher flexibility and better correction capability is proposed. The method is composed of variable attenuation correction element arrays which are inserted into the edge of an illumination field to shield the energy through programming. Based on the proposed method, a programmable uniformity correction unit is applied to an illumination optical system. The simulation results show that the value of the corrected IINU reaches less than 0.25%, which satisfies the requirements of IINU hi advanced lithography system, and the energy loss is less than 1.1%. It verifies the higher flexibility and better correction capability of the proposed method.
文章类型Article
部门归属信息光电
DOI10.1016/j.optcom.2017.01.023
资助者International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402]
收录类别SCI
资助者International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402]
WOS记录号WOS:000395604500015
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28521
专题信息光学与光电技术实验室
通讯作者huanghuijie@siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Cheng, Weilin,Zhang, Yunbo,Zhu, Jing,et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Opt. Commun.,2017,392:77.
APA Cheng, Weilin.,Zhang, Yunbo.,Zhu, Jing.,Yang, Baoxi.,Zeng, Aijun.,...&huanghuijie@siom.ac.cn.(2017).Programmable uniformity correction by using plug-in finger arrays in advanced lithography system.Opt. Commun.,392,77.
MLA Cheng, Weilin,et al."Programmable uniformity correction by using plug-in finger arrays in advanced lithography system".Opt. Commun. 392(2017):77.
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