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Programmable uniformity correction by using plug-in finger arrays in advanced lithography system
Cheng, Weilin; Zhang, Yunbo; Zhu, Jing; Yang, Baoxi; Zeng, Aijun; Huang, Huijie; huanghuijie@siom.ac.cn
2017
Source PublicationOpt. Commun.
Volume392Pages:77
AbstractIllumination integrated non-uniformity (IINU) is one of the key factors to determine the resolution and Critical Dimension Uniformity (CDU) which are important performance parameters in advanced lithography system. To further reduce the IINU, uniformity correction technology has been adopted. In this paper, an approach of programmable uniformity correction with higher flexibility and better correction capability is proposed. The method is composed of variable attenuation correction element arrays which are inserted into the edge of an illumination field to shield the energy through programming. Based on the proposed method, a programmable uniformity correction unit is applied to an illumination optical system. The simulation results show that the value of the corrected IINU reaches less than 0.25%, which satisfies the requirements of IINU hi advanced lithography system, and the energy loss is less than 1.1%. It verifies the higher flexibility and better correction capability of the proposed method.
SubtypeArticle
Department信息光电
DOI10.1016/j.optcom.2017.01.023
Funding OrganizationInternational Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402]
Indexed BySCI
Funding OrganizationInternational Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] ; International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402]
WOS IDWOS:000395604500015
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28521
Collection信息光学与光电技术实验室
Corresponding Authorhuanghuijie@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Cheng, Weilin,Zhang, Yunbo,Zhu, Jing,et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Opt. Commun.,2017,392:77.
APA Cheng, Weilin.,Zhang, Yunbo.,Zhu, Jing.,Yang, Baoxi.,Zeng, Aijun.,...&huanghuijie@siom.ac.cn.(2017).Programmable uniformity correction by using plug-in finger arrays in advanced lithography system.Opt. Commun.,392,77.
MLA Cheng, Weilin,et al."Programmable uniformity correction by using plug-in finger arrays in advanced lithography system".Opt. Commun. 392(2017):77.
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