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Pixelated source optimization for optical lithography via particle swarm optimization
Wang, Lei; Li, Sikun; Wang, Xiangzhao; Yan, Guanyong; Yang, Chaoxing; wxz26267@siom.ac.cn
2016
发表期刊J. Micro-Nanolithogr. MEMS MOEMS
卷号15期号:1
摘要Source optimization is one of the key techniques for achieving higher resolution without increasing the complexity of mask design. An efficient source optimization approach is proposed on the basis of particle swarm optimization. The pixelated sources are encoded into particles, which are evaluated by using the pattern error as the fitness function. Afterward, the optimization is implemented by updating the velocities and positions of these particles. This approach is demonstrated using three mask patterns, including a periodic array of contact holes, a vertical line/space design, and a complicated pattern. The pattern errors are reduced by 69.6%, 51.5%, and 40.3%, respectively. Compared with the source optimization approach via genetic algorithm, the proposed approach leads to faster convergence while improving the image quality at the same time. Compared with the source optimization approach via gradient descent method, the proposed approach does not need the calculation of gradients, and it has a strong adaptation to various lithographic models, fitness functions, and resist models. The robustness of the proposed approach to initial sources is also verified. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
文章类型Article
部门归属信息光电
DOI10.1117/1.JMM.15.1.013506
资助者National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210]
收录类别SCI
资助者National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210]
WOS记录号WOS:000374540300008
引用统计
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28518
专题信息光学与光电技术实验室
通讯作者wxz26267@siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Wang, Lei,Li, Sikun,Wang, Xiangzhao,et al. Pixelated source optimization for optical lithography via particle swarm optimization[J]. J. Micro-Nanolithogr. MEMS MOEMS,2016,15(1).
APA Wang, Lei,Li, Sikun,Wang, Xiangzhao,Yan, Guanyong,Yang, Chaoxing,&wxz26267@siom.ac.cn.(2016).Pixelated source optimization for optical lithography via particle swarm optimization.J. Micro-Nanolithogr. MEMS MOEMS,15(1).
MLA Wang, Lei,et al."Pixelated source optimization for optical lithography via particle swarm optimization".J. Micro-Nanolithogr. MEMS MOEMS 15.1(2016).
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