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General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination
Shen, Lina; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Zhu, Boer; Zhang, Heng; wxz26267@siom.ac.cn
2016
Source PublicationJ. Opt. Soc. Am. A-Opt. Image Sci. Vis.
Volume33Issue:6Pages:1112
AbstractWith the shrinking of the critical dimension, the impact of polarization aberration on lithographic imaging becomes increasingly prominent. In this paper, the linear relationships between the image placement error and odd Pauli-Zernike polarization aberrations, as well as those between the best focus shift and even Pauli-Zernike polarization aberrations, are established by analyzing the imaging of the alternating phase-shifting mask. The relational expressions of the polarization aberration sensitivities ( PAS) and the polarization angle of illumination are obtained based on these linear relationships. Then the expressions for the zero-value points and extremum points of the PAS are derived, and the impact of the polarization angle of illumination on the PAS is analyzed. The derived analytical expressions match the simulation results well; these can be used to analyze the detrimental impact of polarization aberration on lithographic imaging and provide a theoretical basis for exploring polarization aberration measurement and control techniques. (C)2016 Optical Society of America
SubtypeArticle
Department信息光电
DOI10.1364/JOSAA.33.001112
Funding OrganizationNational Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210]
Indexed BySCI
Funding OrganizationNational Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] ; National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210]
WOS IDWOS:000377513300013
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28495
Collection信息光学与光电技术实验室
Corresponding Authorwxz26267@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Shen, Lina,Wang, Xiangzhao,Li, Sikun,et al. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination[J]. J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,2016,33(6):1112.
APA Shen, Lina.,Wang, Xiangzhao.,Li, Sikun.,Yan, Guanyong.,Zhu, Boer.,...&wxz26267@siom.ac.cn.(2016).General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,33(6),1112.
MLA Shen, Lina,et al."General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination".J. Opt. Soc. Am. A-Opt. Image Sci. Vis. 33.6(2016):1112.
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