SIOM OpenIR  > 中科院强激光材料重点实验室
Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect
Zhang Dongping; Zhu Maodong; Li Yan; Zhang Weili; Cai Xingmin; Ye Fan; Liang Guangxing; Zheng Zhuanghao; Fan Ping; Xia Zhilin; ahzhangdp@163.com; xiazhilin@whut.edu.cn
2017
Source PublicationJ. Wuhan Univ. Technol.-Mat. Sci. Edit.
Volume32Issue:5Pages:1057
AbstractAl2O3/SiO2 multilayer high-reflective (HR) mirrors at 355 nm were prepared by electron beam evaporation, and post-irradiated with Ar/O mixture plasma. The surface defect density, reflective spectra, and laser-induced damage characteristics were measured using optical microscopy, spectrophotometry, a damage testing system, and scanning electron microscopy (SEM), respectively. The results indicated that moderate-time of irradiation enhanced the laser-induced damage threshold (LIDT) of the mirror, but prolonged irradiation produced surface defects, resulting in LIDT degradation. LIDT of the mirrors initially increased and subsequently decreased with the plasma processing time. SEM damage morphologies of the mirrors revealed that nanoscale absorbing defects in sub-layers was one of the key factors limiting the improvement of LIDT in 355 nm HR mirror.
SubtypeArticle
Department材料
DOI10.1007/s11595-017-1710-y
Funding OrganizationNational Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966]
Indexed BySCI
Funding OrganizationNational Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] ; National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966]
WOS IDWOS:000412950000011
Citation statistics
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28122
Collection中科院强激光材料重点实验室
Corresponding Authorahzhangdp@163.com; xiazhilin@whut.edu.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Zhang Dongping,Zhu Maodong,Li Yan,et al. Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect[J]. J. Wuhan Univ. Technol.-Mat. Sci. Edit.,2017,32(5):1057.
APA Zhang Dongping.,Zhu Maodong.,Li Yan.,Zhang Weili.,Cai Xingmin.,...&xiazhilin@whut.edu.cn.(2017).Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect.J. Wuhan Univ. Technol.-Mat. Sci. Edit.,32(5),1057.
MLA Zhang Dongping,et al."Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect".J. Wuhan Univ. Technol.-Mat. Sci. Edit. 32.5(2017):1057.
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