SIOM OpenIR  > 中科院强激光材料重点实验室
Interface characterization of Mo/Si multilayers
Zhao JL(赵娇玲); He HB(贺洪波); Wang H(王虎); Yi K(易葵); Wang B(王斌); Cui Y(崔云); hbhe@siom.ac.cn
2016
Source PublicationChin. Opt. Lett.
Volume14Issue:8
AbstractComplementary analysis techniques are applied in this work to study the interface structure of Mo/Si multilayers. The samples are characterized by grazing incident x-ray reflectivity, x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, and extreme ultraviolet reflectivity. The results indicate that the layer thickness is controlled well with small diffusion on the interface by forming MoSi2. Considering MoSi2 as the interface composition, simulating the result of our four-layer model fits well with the measured reflectivity curve at 13.5 nm.
SubtypeArticle
Department材料
DOI10.3788/COL201614.083401
Funding OrganizationInternational Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328]
Indexed BySCI
Funding OrganizationInternational Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328]
WOS IDWOS:000382513100022
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Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28116
Collection中科院强激光材料重点实验室
Corresponding Authorhbhe@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Zhao JL,He HB,Wang H,et al. Interface characterization of Mo/Si multilayers[J]. Chin. Opt. Lett.,2016,14(8).
APA 赵娇玲.,贺洪波.,王虎.,易葵.,王斌.,...&hbhe@siom.ac.cn.(2016).Interface characterization of Mo/Si multilayers.Chin. Opt. Lett.,14(8).
MLA 赵娇玲,et al."Interface characterization of Mo/Si multilayers".Chin. Opt. Lett. 14.8(2016).
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