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Interface characterization of Mo/Si multilayers
Zhao JL(赵娇玲); He HB(贺洪波); Wang H(王虎); Yi K(易葵); Wang B(王斌); Cui Y(崔云); hbhe@siom.ac.cn
2016
发表期刊Chin. Opt. Lett.
卷号14期号:8
摘要Complementary analysis techniques are applied in this work to study the interface structure of Mo/Si multilayers. The samples are characterized by grazing incident x-ray reflectivity, x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, and extreme ultraviolet reflectivity. The results indicate that the layer thickness is controlled well with small diffusion on the interface by forming MoSi2. Considering MoSi2 as the interface composition, simulating the result of our four-layer model fits well with the measured reflectivity curve at 13.5 nm.
文章类型Article
部门归属材料
DOI10.3788/COL201614.083401
资助者International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328]
收录类别SCI
资助者International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328] ; International Science & Technology Cooperation Program of China [2012DFG51590]; National Natural Science Foundation of China [11304328]
WOS记录号WOS:000382513100022
引用统计
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28116
专题中科院强激光材料重点实验室
通讯作者hbhe@siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
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GB/T 7714
Zhao JL,He HB,Wang H,et al. Interface characterization of Mo/Si multilayers[J]. Chin. Opt. Lett.,2016,14(8).
APA 赵娇玲.,贺洪波.,王虎.,易葵.,王斌.,...&hbhe@siom.ac.cn.(2016).Interface characterization of Mo/Si multilayers.Chin. Opt. Lett.,14(8).
MLA 赵娇玲,et al."Interface characterization of Mo/Si multilayers".Chin. Opt. Lett. 14.8(2016).
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