SIOM OpenIR  > 中科院强激光材料重点实验室
Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning
Zhu, Meiping; Xing, Huanbin; Chai, Yingjie; Yi, Kui; Sun, Jian; Wang, Jianguo; Shao, Jianda; bree@siom.ac.an; jdshao@siom.ac.cn
2017
Source PublicationOpt. Eng.
Volume56Issue:1
AbstractBK7 glass substrates were precleaned by different cleaning procedures before being loaded into a vacuum chamber, and then a series of plasma ion cleaning procedures were conducted at different bias voltages in the vacuum chamber, prior to the deposition of 532-nm antireflection (AR) coatings. The plasma ion cleaning process was implemented by the plasma ion bombardment from an advanced plasma source. The surface morphology of the plasma ion-cleaned substrate, as well as the laser-induced damage threshold (LIDT) of the 532-nm AR coating was investigated. The results indicated that the LIDT of 532-nm AR coating can be greatly influenced by the plasma ion cleaning energy. The plasma ion cleaning with lower energy is an attractive method to improve the LIDT of the 532-nm AR coating, due to the removal of the adsorbed contaminations on the substrate surface, as well as the removal of part of the chemical impurities hidden in the surface layer. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
SubtypeArticle
Department材料
DOI10.1117/1.OE.56.1.011003
Funding OrganizationNational Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences
Indexed BySCI
Funding OrganizationNational Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; National Science Foundation of China [61505227]; Youth Innovation Promotion Association of the Chinese Academy of Sciences
WOS IDWOS:000396389400006
Citation statistics
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28107
Collection中科院强激光材料重点实验室
Corresponding Authorbree@siom.ac.an; jdshao@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Zhu, Meiping,Xing, Huanbin,Chai, Yingjie,et al. Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning[J]. Opt. Eng.,2017,56(1).
APA Zhu, Meiping.,Xing, Huanbin.,Chai, Yingjie.,Yi, Kui.,Sun, Jian.,...&jdshao@siom.ac.cn.(2017).Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning.Opt. Eng.,56(1).
MLA Zhu, Meiping,et al."Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning".Opt. Eng. 56.1(2017).
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