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Effect of Substrate's Crystalline Structure on Crystalline and Mechanical Properties of HfO_2 Thin Films
Guo JL(郭佳露); Liu XF(刘晓凤); Zhao YA(赵元安); Shao JD(邵建达); Zhao JL(赵娇玲); Huang HP(黄昊鹏); Cui YY(崔岩岩); guojialu@siom.ac.cn; liuxiaofeng@mail.siom.ac.cn; yazhao@mail.siom.ac.cn
2016
发表期刊中国激光
卷号43期号:6页码:603001
摘要HfO_2 thin films are deposited on the crystal and the laser ceramic by electron beam evaporation technology respectively.Grazing incidence X-ray diffraction(GIXRD)and nano-scratch tester are used to investigate the crystalline structures and mechanical properties of the films.The experimental results show that crystalline orientations of the HfO_2 films on single crystal substrate and polycrystalline ceramic substrate are all polycrystalline structures,and have(020) preferred growth,while the films on ceramic structures have stronger preferred orientation.The crystal-HfO_2 films with a worse adhesive force have more diffraction peaks,while the ceramic-HfO_2 films with a better adhesive force have less diffraction peaks.Compared with the X-ray diffraction(XRD)results of two substrates and the films coated on them,the difference between single crystal structure of crystalline substrate and polycrystalline structure state of film is big,which contributes to a bigger residual stress,and a worse adhesive force between the crystal and the film.The weak binding force leads to small constraint effect of substrate on films.So,the films on the substrate of single crystal have more diffraction peaks.The difference between polycrystalline structure of ceramic substrate and the polycrystalline structure of films is small.This similar crystalline state makes the preferred orientation of the films more obvious and weakens the residual stress.So the adhesive force between the ceramic substrate and the HfO_2 film is relatively better than that of crystal-HfO_2 system.The strong binding force limits the growth of crystal orientation of HfO_2 films,and the diffraction peaks of the films are less.
文章类型Article
其他摘要用电子束蒸发技术在晶体及激光陶瓷两种基底上沉积了氧化铪(HfO_2 )单层膜,采用掠角X射线衍射(GIXRD)技术和纳米划痕仪对薄膜的晶向结构和力学特性进行了研究。实验结果表明,HfO_2薄膜在单晶晶体和多晶陶瓷基底上均呈现多晶态结构,均呈(020)面择优生长,陶瓷基底上薄膜的择优取向更明显。膜基结合较差的晶体-HfO_2体系上薄膜的衍射峰较多,膜基结合较好的陶瓷-HfO_2体系上薄膜的衍射峰较少。对比两个基底和其上薄膜的X射线衍射(XRD)结果发现,晶体基底的单晶结构与其上薄膜的多晶结构晶态差异较大,导
部门归属材料
DOI10.3788/CJL201643.0603001
资助者国家自然科学基金 ; 国家自然科学基金 ; 国家自然科学基金 ; 国家自然科学基金
收录类别CSCD
资助者国家自然科学基金 ; 国家自然科学基金 ; 国家自然科学基金 ; 国家自然科学基金
WOS记录号CSCD:5735537
CSCD记录号CSCD:5735537
引用统计
被引频次:4[CSCD]   [CSCD记录]
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/28056
专题中科院强激光材料重点实验室
通讯作者guojialu@siom.ac.cn; liuxiaofeng@mail.siom.ac.cn; yazhao@mail.siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Guo JL,Liu XF,Zhao YA,et al. Effect of Substrate's Crystalline Structure on Crystalline and Mechanical Properties of HfO_2 Thin Films[J]. 中国激光,2016,43(6):603001.
APA 郭佳露.,刘晓凤.,赵元安.,邵建达.,赵娇玲.,...&yazhao@mail.siom.ac.cn.(2016).Effect of Substrate's Crystalline Structure on Crystalline and Mechanical Properties of HfO_2 Thin Films.中国激光,43(6),603001.
MLA 郭佳露,et al."Effect of Substrate's Crystalline Structure on Crystalline and Mechanical Properties of HfO_2 Thin Films".中国激光 43.6(2016):603001.
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