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Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation
Yu, Zhen; Qi, Hong-Ji; Zhang, Wei-Li; Wang, Hu; Wang, Bin; Wang, Yue-Liang; Huang, Hao-Peng; qhj@siom.ac.cn
2017
Source PublicationChin. Phys. B
Volume26Issue:10
AbstractA systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests.
SubtypeArticle
Department材料
DOI10.1088/1674-1056/26/10/104210
Indexed BySCI
WOS IDWOS:000412420300004
Citation statistics
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/28046
Collection中科院强激光材料重点实验室
Corresponding Authorqhj@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Yu, Zhen,Qi, Hong-Ji,Zhang, Wei-Li,et al. Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation[J]. Chin. Phys. B,2017,26(10).
APA Yu, Zhen.,Qi, Hong-Ji.,Zhang, Wei-Li.,Wang, Hu.,Wang, Bin.,...&qhj@siom.ac.cn.(2017).Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation.Chin. Phys. B,26(10).
MLA Yu, Zhen,et al."Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation".Chin. Phys. B 26.10(2017).
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