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Optimization of Morphology of Laser Induced Damage Mitigation Pit on Silica Optical Component
Zhou L(周丽); Jiang YE(姜有恩); Wei H(韦辉); Fan W(范薇); Li XC(李学春); zhoul@siom.ac.cn; joyen@siom.ac.cn; lixuechun@siom.ac.cn
2016
Source Publication中国激光
Volume43Issue:6Pages:602009
AbstractAiming at morphology of laser induced damage mitigation pit on the rear surface of 3omegasilica optical component,the mitigated area and its downstream intensity distributions with different morphologies are simulated by finite-difference time-domain method (FDTD)and Rayleigh-Sommerfeld (R-S)diffraction integral method, respectively.The results show that when the angle between the tangent line of endpoints on the section contour of the pit and incident light is over 70°,the maximum intensity inside the mitigated optics is less than 1.66,and mitigation effect is better than that of other angles.The maximum downstream intensities of a pit in shape of parabolic surface,cone and truncated cone are all less than 1.46with an angle of 70°and a width of 200mum.But when the width of pit increases to 1mm,for instance,the maximum downstream intensity is as high as 9.31and area with high intensity covers a long range.Thus,taking the difficulty of laser machining technology into account, a conical pit with an angle larger than 70°is the first choice for the damage mitigation on the rear surface of silica optical component.
SubtypeArticle
Other Abstract针对三倍频光学元件后表面的损伤修复形貌,分别采用时域有限差分法(FDTD)和瑞利-索末菲(R-S)衍射积分法,来模拟不同形貌下元件修复区域内以及其后续的光场分布。结果表明,当修复坑截面轮廓线端点切线与光束传播方向夹角大于70°时,元件内部光强极大值小于1.66,修复效果优于其他角度。夹角为70°、宽200mum的抛物面型、圆锥型和圆台型凹坑的后续光强极大值小于1.46。但是当修复坑宽度较大如达到1mm时,圆台型凹坑的后续光强极大值高达9.31,且作用区间长。因此,考虑实际激光修复工艺的难度,夹角大于70°
Department联合
DOI10.3788/CJL201643.0602009
Funding Organization中国科学院青年创新促进会 ; 中国科学院青年创新促进会 ; 中国科学院青年创新促进会 ; 中国科学院青年创新促进会
Indexed ByCSCD
Funding Organization中国科学院青年创新促进会 ; 中国科学院青年创新促进会 ; 中国科学院青年创新促进会 ; 中国科学院青年创新促进会
WOS IDCSCD:5735535
CSCD IDCSCD:5735535
Citation statistics
Document Type期刊论文
Identifierhttp://ir.siom.ac.cn/handle/181231/27891
Collection高功率激光物理国家实验室
Corresponding Authorzhoul@siom.ac.cn; joyen@siom.ac.cn; lixuechun@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Zhou L,Jiang YE,Wei H,et al. Optimization of Morphology of Laser Induced Damage Mitigation Pit on Silica Optical Component[J]. 中国激光,2016,43(6):602009.
APA 周丽.,姜有恩.,韦辉.,范薇.,李学春.,...&lixuechun@siom.ac.cn.(2016).Optimization of Morphology of Laser Induced Damage Mitigation Pit on Silica Optical Component.中国激光,43(6),602009.
MLA 周丽,et al."Optimization of Morphology of Laser Induced Damage Mitigation Pit on Silica Optical Component".中国激光 43.6(2016):602009.
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