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Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser
Sun, Mingying; Zhu, Jianqiang; Lin, Zunqi; sunmy@siom.ac.cn
2017
发表期刊Opt. Eng.
卷号56期号:1
摘要We present a numerical model of plasma formation in ultrafast laser ablation on the dielectrics surface. Ablation threshold dependence on pulse duration is predicted with the model and the numerical results for water agrees well with the experimental data for pulse duration from 140 fs to 10 ps. Influences of parameters and approximations of photo- and avalanche-ionization on the ablation threshold prediction are analyzed in detail for various pulse lengths. The calculated ablation threshold is strongly dependent on electron collision time for all the pulse durations. The complete photoionization model is preferred for pulses shorter than 1 ps rather than the multiphoton ionization approximations. The transition time of inverse bremsstrahlung absorption needs to be considered when pulses are shorter than 5 ps and it can also ensure the avalanche ionization (AI) coefficient consistent with that in multiple rate equations (MREs) for pulses shorter than 300 fs. The threshold electron density for AI is only crucial for longer pulses. It is reasonable to ignore the recombination loss for pulses shorter than 100 fs. In addition to thermal transport and hydrodynamics, neglecting the threshold density for AI and recombination could also contribute to the disagreements between the numerical and the experimental results for longer pulses. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
文章类型Article
部门归属联合
DOI10.1117/1.OE.56.1.011026
资助者Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040]
收录类别SCI
资助者Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040] ; Open Research Fund of State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute [SKL2014KF05]; Fund of Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences [CXJJ-16S040]
WOS记录号WOS:000396389400029
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.siom.ac.cn/handle/181231/27883
专题高功率激光物理国家实验室
通讯作者sunmy@siom.ac.cn
作者单位中国科学院上海光学精密机械研究所
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GB/T 7714
Sun, Mingying,Zhu, Jianqiang,Lin, Zunqi,et al. Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser[J]. Opt. Eng.,2017,56(1).
APA Sun, Mingying,Zhu, Jianqiang,Lin, Zunqi,&sunmy@siom.ac.cn.(2017).Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser.Opt. Eng.,56(1).
MLA Sun, Mingying,et al."Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser".Opt. Eng. 56.1(2017).
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