SIOM OpenIR  > 信息光学与光电技术实验室
Interference pattern period measurement at picometer level
Xiang, Xiansong; Wei, Chunlong; Jia, Wei; Zhou, Changhe; Li, Minkang; Lu, Yancong; xiangxs@siom.ac.cn
2017
Source PublicationHOLOGRAPHY, DIFFRACTIVE OPTICS, AND APPLICATIONS VII
ISSN0277-786X
Department信息光电
AbstractTo produce large scale gratings by Scanning Beam Interference Lithography (SBIL), a light spot containing grating pattern is generated by two beams interfering, and a scanning stage is used to drive the substrate moving under the light spot. In order to locate the stage at the proper exposure positions, the period of the Interference pattern must be measured accurately. We developed a set of process to obtain the period value of two interfering beams at picometer level. The process includes data acquisition and data analysis. The data is received from a photodiode and a laser interferometer with sub-nanometer resolution. Data analysis differs from conventional analyzing methods like counting wave peaks or using Fourier transform to get the signal period, after a preprocess of filtering and envelope removing, the mean square error is calculated between the received signal and ideal sinusoid waves to find the best-fit frequency, thus an accuracy period value is acquired, this method has a low sensitivity to amplitude noise and a high resolution of frequency. With 405nm laser beams interfering, a pattern period value around 562nm is acquired by employing this process, fitting diagram of the result shows the accuracy of the period value reaches picometer level, which is much higher than the results of conventional methods.
Language英语
Document Type会议论文
Identifierhttp://ir.siom.ac.cn/handle/181231/27451
Collection信息光学与光电技术实验室
Corresponding Authorxiangxs@siom.ac.cn
Affiliation中国科学院上海光学精密机械研究所
Recommended Citation
GB/T 7714
Xiang, Xiansong,Wei, Chunlong,Jia, Wei,et al. Interference pattern period measurement at picometer level[C],2017.
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