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Image grating metrology using phase-stepping interferometry in scanning beam interference lithography
Li, Minkang; Zhou, Changhe; Wei, Chunlong; Jia, Wei; Lu, Yancong; Xiang, Changcheng; Xiang, XianSong; chazhou@mail.shcnc.ac.cn
2017
Source PublicationHOLOGRAPHY, DIFFRACTIVE OPTICS, AND APPLICATIONS VII
ISSN0277-786X
Department信息光电
AbstractLarge-sized gratings are essential optical elements in laser fusion and space astronomy facilities. Scanning beam interference lithography is an effective method to fabricate large-sized gratings. To minimize the nonlinear phase written into the photo-resist, the image grating must be measured to adjust the left and right beams to interfere at their waists. In this paper, we propose a new method to conduct wavefront metrology based on phase-stepping interferometry. Firstly, a transmission grating is used to combine the two beams to form an interferogram which is recorded by a charge coupled device(CCD). Phase steps are introduced by moving the grating with a linear stage monitored by a laser interferometer. A series of interferograms are recorded as the displacement is measured by the laser interferometer. Secondly, to eliminate the tilt and piston error during the phase stepping, the iterative least square phase shift method is implemented to obtain the wrapped phase. Thirdly, we use the discrete cosine transform least square method to unwrap the phase map. Experiment results indicate that the measured wavefront has a nonlinear phase around 0.05 lambda@404.7nm. Finally, as the image grating is acquired, we simulate the print-error written into the photo-resist.
Language英语
Document Type会议论文
Identifierhttp://ir.siom.ac.cn/handle/181231/27341
Collection信息光学与光电技术实验室
Corresponding Authorchazhou@mail.shcnc.ac.cn
Recommended Citation
GB/T 7714
Li, Minkang,Zhou, Changhe,Wei, Chunlong,et al. Image grating metrology using phase-stepping interferometry in scanning beam interference lithography[C],2017.
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