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Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors
Zhao, YN; Wang, YJ; Gong, H; Shao, JD; Fan, ZX; Zhao, YN (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin Film Coatings, Shanghai 201800, Peoples R China
2003
Source PublicationAppl. Surf. Sci.
Volume210Issue:3_4Pages:353
AbstractThe effects of annealing on structure and laser-induced damage threshold (LIDT) of Ta2O5/SiO2 dielectric mirrors were investigated. Ta2O5/SiO2 multilayer was prepared by ion beam sputtering (IBS), then annealed in air under the temperature from 100 to 400 degreesC. Microstructure of the samples was characterized by X-ray diffraction (XRD). Absorption of the multilayer was measured by surface thermal lensing (STL) technique. The laser-induced damage threshold was assessed using 1064 nm free pulsed laser at a pulse length of 220 mus. It was found that the center wavelength shifted to long wavelength gradually as the annealing temperature increased, and, kept its non-crystalline structure even after annealing. The absorbance of the reflectors decreased after annealing. A remarkable increase of the laser-induced damage threshold was found when the annealing temperature was above 250 degreesC. (C) 2003 Elsevier Science B.V. All rights reserved.
SubtypeArticle
DOI10.1016/S0169-4332(03)00153-3
Indexed BySCI
Language英语
WOS IDWOS:000182301400024
Citation statistics
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/18466
Collection光学薄膜技术研究与发展中心
Corresponding AuthorZhao, YN (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin Film Coatings, Shanghai 201800, Peoples R China
AffiliationChinese Acad Sci, Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin Film Coatings, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Zhao, YN,Wang, YJ,Gong, H,et al. Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors[J]. Appl. Surf. Sci.,2003,210(3_4):353.
APA Zhao, YN,Wang, YJ,Gong, H,Shao, JD,Fan, ZX,&Zhao, YN .(2003).Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors.Appl. Surf. Sci.,210(3_4),353.
MLA Zhao, YN,et al."Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors".Appl. Surf. Sci. 210.3_4(2003):353.
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