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超分辨近场结构光刻技术
Alternative TitlePhotolithography Using Super-Resolution Near Field Structure
张锋; 王阳; 徐文东
2003
Source Publication激光与光电子学进展
Volume40Issue:9Pages:25
Abstract介绍了一种新的近场光刻技术的基本原理及其在光刻方面的应用研究的最新进展。新技术的基本原理是:光远场照射,通过超分辨掩模产生光刻所需的超过衍射极限的近场光,利用夹在掩模和光刻胶中间的电介质保护层实现了近场光的最佳耦合,减小了线宽并大大提高了光刻速度。这种膜层结构叫超分辨近场结构(Super-RENS),是近年来发展起来r 一种新的近场光学技术。
SubtypeArticle
Other AbstractThis paper introduces a new near-field photolithography technology. Its principle is: laser irradiates from far-field and produces near-field light of super-resolution through the mask layer. Making use of the dielectric layer between the mask layer and the photoresist, the best coupling of near-field light is realized which can minimize the linewidth and improve the photolithography speed greatly. This structure is called Super-RENS (Super-resolution near field structure). It is a newly developed near-field optical technology. Recent progress of its applications in photolithography are introduced.
Funding Organization国家十五863计划(2002AA313030) ; 国家自然科学基金(60207005) ; 上海市科技发展基金(022261045)资助课题 ; 国家十五863计划(2002AA313030) ; 国家自然科学基金(60207005) ; 上海市科技发展基金(022261045)资助课题
Indexed ByCSCD
Language中文
Funding Organization国家十五863计划(2002AA313030) ; 国家自然科学基金(60207005) ; 上海市科技发展基金(022261045)资助课题 ; 国家十五863计划(2002AA313030) ; 国家自然科学基金(60207005) ; 上海市科技发展基金(022261045)资助课题
CSCD IDCSCD:1232395
Citation statistics
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/18300
Collection高密度光存储技术实验室
Affiliation1.Zhang Feng, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China.
2.Wang Yang, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China.
3.Xu Wendong, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China.
Recommended Citation
GB/T 7714
张锋,王阳,徐文东. 超分辨近场结构光刻技术[J]. 激光与光电子学进展,2003,40(9):25.
APA 张锋,王阳,&徐文东.(2003).超分辨近场结构光刻技术.激光与光电子学进展,40(9),25.
MLA 张锋,et al."超分辨近场结构光刻技术".激光与光电子学进展 40.9(2003):25.
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