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Nanoring formation by direct-write inorganic electron-beam lithography
Jiang, N; Hembree, GG; Spence, JCH; Qiu, J; de Abajo, FJG; Silcox, J; Jiang, N (reprint author), Arizona State Univ, Dept Phys & Astron, Tempe, AZ 85287 USA
2003
Source PublicationAppl. Phys. Lett.
Volume83Issue:3Pages:551
AbstractA direct-write inorganic lithography technique is described which is capable of forming nanoscale rings of amorphous metals and semiconductors in glasses. Near-edge electron energy loss spectroscopy and electron diffraction using a subnanometer probe are used to analyze the composition and formation mechanism of these nanorings. The optical absorption cross section of one ring is calculated by multiple scattering methods. Applications in quantum electronics and the design of media with dielectric properties are suggested. (C) 2003 American Institute of Physics.
SubtypeArticle
DOI10.1063/1.1592895
Indexed BySCI
Language英语
WOS IDWOS:000184186700049
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Cited Times:39[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/18286
Collection高功率激光单元技术研发中心
Corresponding AuthorJiang, N (reprint author), Arizona State Univ, Dept Phys & Astron, Tempe, AZ 85287 USA
Affiliation1.Arizona State Univ, Dept Phys & Astron, Tempe, AZ 85287 USA
2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Photon Craft Project, Shanghai 201800, Peoples R China
3.Donostia Int Phys Ctr, San Sebastian, Spain
4.Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Recommended Citation
GB/T 7714
Jiang, N,Hembree, GG,Spence, JCH,et al. Nanoring formation by direct-write inorganic electron-beam lithography[J]. Appl. Phys. Lett.,2003,83(3):551.
APA Jiang, N.,Hembree, GG.,Spence, JCH.,Qiu, J.,de Abajo, FJG.,...&Jiang, N .(2003).Nanoring formation by direct-write inorganic electron-beam lithography.Appl. Phys. Lett.,83(3),551.
MLA Jiang, N,et al."Nanoring formation by direct-write inorganic electron-beam lithography".Appl. Phys. Lett. 83.3(2003):551.
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