| AgO_x掩膜的制备和性能研究 | |
| Alternative Title | Preparation and properties investigation of AgO_x mask films |
| 张约品; 阮昊; 沈德芳; 干福熹 | |
| 2003 | |
| Source Publication | 功能材料
 |
| Volume | 34Issue:2Pages:156 |
| Abstract | 磁控反应溅射制备了AgOx掩膜，用聚焦激光热效应装置测得的光透过特性，分析了AgOx掩膜的开关性能。结果表明，AgOx掩膜在较低的温度作用下有良好的开关性能，反应AgOx Ag＋O2可逆,适用于LSC-super-REMS光盘。用X-ray和TEM分析了热处理后的AgOx薄膜的成分结构，表明200℃热处理AgOx掩膜存在的纳米量级Ag颗粒。 |
| Subtype | Article |
| Other Abstract | In this work AgOx mask films for super resolution near-field structure application were prepared by reactive sputtering. The switch properties of AgOx mask films were analyzed by the transmittance property measured by the focused laser thermal effect exper imental scheme. Results indicated that the mask films AgOx had excellent switch properties at low temperature, the reaction AgOx? Ag+O_2 was reversible, and the mask films were suitable for using in LSC-super-RENS disk. The composition and structure were in vestigated by X-ray diffraction spectrum and TEM. The results give out that the 200℃ calcined AgOx layers have silver nanometer , grains for near-field scattering center. |
| Funding Organization | 国家自然科学基金重点资助项目（59832060） ; 国家重点基础研究发展计划（973计划）资助项目（19990330） ; 国家自然科学基金重点资助项目（59832060） ; 国家重点基础研究发展计划（973计划）资助项目（19990330） |
| Indexed By | CSCD |
| Language | 中文 |
| Funding Organization | 国家自然科学基金重点资助项目（59832060） ; 国家重点基础研究发展计划（973计划）资助项目（19990330） ; 国家自然科学基金重点资助项目（59832060） ; 国家重点基础研究发展计划（973计划）资助项目（19990330） |
| CSCD ID | CSCD:1308725 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Version | 出版稿 |
| Identifier | http://ir.siom.ac.cn/handle/181231/18189 |
| Collection | 高密度光存储技术实验室 |
| Affiliation | 1.Zhang Yuepin, Shanghai Institute of Opties and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China. 2.Ruan Hao, Shanghai Institute of Opties and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China. 3.Shen Defang, Shanghai Institute of Opties and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China. 4.Gan Fuxi, Shanghai Institute of Opties and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China. |
| Recommended Citation GB/T 7714 | 张约品,阮昊,沈德芳,等. AgO_x掩膜的制备和性能研究[J]. 功能材料,2003,34(2):156. |
| APA | 张约品,阮昊,沈德芳,&干福熹.(2003).AgO_x掩膜的制备和性能研究.功能材料,34(2),156. |
| MLA | 张约品,et al."AgO_x掩膜的制备和性能研究".功能材料 34.2(2003):156. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 203.pdf（121KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | Application Full Text | |
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