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Preparation of ultralow loss mirrors with reflectivity of over 99.9968%
Wang, YJ; Fan, ZX; Wang, YJ (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, 390 Qinghe Rd,JiaDing, Shanghai 201800, Peoples R China
2003
Source PublicationLaser Phys.
Volume13Issue:9Pages:1166
AbstractUltralow loss mirrors (at the wavelength of 1315 nm) were prepared by RF ion beam sputtering with materials of tantalum oxide and silicon oxide. The mirror loss (A + S + T), including directly measured transmission, scattering, and absorption, respectively, is less than 32 ppm, which corresponds to a reflectivity of over 99.9968%. This is the highest reflectivity achieved at this wavelength in published reports.
SubtypeArticle
Indexed BySCI
Language英语
WOS IDWOS:000185725700007
Citation statistics
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/18057
Collection光学薄膜技术研究与发展中心
Corresponding AuthorWang, YJ (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, 390 Qinghe Rd,JiaDing, Shanghai 201800, Peoples R China
AffiliationChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Wang, YJ,Fan, ZX,Wang, YJ . Preparation of ultralow loss mirrors with reflectivity of over 99.9968%[J]. Laser Phys.,2003,13(9):1166.
APA Wang, YJ,Fan, ZX,&Wang, YJ .(2003).Preparation of ultralow loss mirrors with reflectivity of over 99.9968%.Laser Phys.,13(9),1166.
MLA Wang, YJ,et al."Preparation of ultralow loss mirrors with reflectivity of over 99.9968%".Laser Phys. 13.9(2003):1166.
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