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紫外激光刻蚀氧化锆陶瓷初步研究
Alternative TitleEtching of ZrO_2 ceramic with UV laser ablation
凌磊; 楼祺洪; 叶震寰; 董景星; 魏运荣
2002
Source Publication应用激光
Volume22Issue:4Pages:405
Abstract描述了KrF准分子孙地氧化锆陶瓷的微刻蚀实验,研究了脉冲刻蚀深度与脉冲数的关系(刻蚀速率),刻蚀的槽的形貌,并进行了刻蚀小孔的初步研究,得到直径为40mum,深度为25mum的微孔矩阵。为KrF激光对该材料的加工提供实验数据。
SubtypeArticle
Other AbstractThe experiment of micro-ablation of ZrO_2 ceramic by KrF excimer laser is described in this paper. the relationship between etching depth and laser pulse number, and the morphology of etching groove are investigated. The micro-holes with 40mum diameter and 25mum deepness are obtained. The results give the fundamental data for KrF laser ceramic processing.
Indexed ByCSCD
Language中文
CSCD IDCSCD:1037198
Citation statistics
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/18041
Collection先进激光技术与应用系统实验室
Affiliation1.凌磊, 中国科学院上海光学与精密机械研究所, 上海 201800, 中国.
2.楼祺洪, 中国科学院上海光学与精密机械研究所, 上海 201800, 中国.
3.叶震寰, 中国科学院上海光学与精密机械研究所, 上海 201800, 中国.
4.董景星, 中国科学院上海光学与精密机械研究所, 上海 201800, 中国.
5.魏运荣, 中国科学院上海光学与精密机械研究所, 上海 201800, 中国.
Recommended Citation
GB/T 7714
凌磊,楼祺洪,叶震寰,等. 紫外激光刻蚀氧化锆陶瓷初步研究[J]. 应用激光,2002,22(4):405.
APA 凌磊,楼祺洪,叶震寰,董景星,&魏运荣.(2002).紫外激光刻蚀氧化锆陶瓷初步研究.应用激光,22(4),405.
MLA 凌磊,et al."紫外激光刻蚀氧化锆陶瓷初步研究".应用激光 22.4(2002):405.
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