光盘反射层纳米Al膜性能研究 | |
Alternative Title | The Characteristics of Al Nano-films Used as Optical Disk Reflective Layer |
刘波; 阮昊; 干福熹 | |
2002 | |
Source Publication | 光电子·激光
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Volume | 13Issue:10Pages:987 |
Abstract | 利用原子力显微镜(AFM)和椭圆偏振仪研究了溅射条件对纳米Al薄膜性能的影响。研究表明,随溅射Ar气压的增大,纳米Al膜的表面粗糙度增加,折射率降低,反射率减少,这与薄膜的结构变化密切相关;随溅射功率的增大,纳米Al膜的表面粗糙度增加,而其光学常数的变化则不明显。 |
Subtype | Article |
Other Abstract | The characteristics of Al nano-film were studied by using AFM and spectroscopic ellipsometer methods. It was indicated that the surface roughness of sputtered Al nano-film, from 1.216 nm (rms) at 0.4 Pa to 3.521 nm at 1.6 Pa, is proportional to the sputtering Ar pressure. The refractive index, extinction coefficient and reflectivity of Al nano-film all decrease as the sputtering Ar pressure increases. The above phenomenon is related to the change of Al nano-film structure. In most cases, the reflectivity of Al nano-film is more than 85%. It was also indicated that the surface roughness of sputtered Al nano-film increases when the sputtering power increases, from 0.486 nm at 1000 W changing to 2.014 nm at 2500 W. However the optical constants of Al nano-film are not sensitive to the sputtering power. |
Funding Organization | 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 ; 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 |
Indexed By | CSCD |
Language | 中文 |
Funding Organization | 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 ; 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 |
CSCD ID | CSCD:1021358 |
Citation statistics | |
Document Type | 期刊论文 |
Version | 出版稿 |
Identifier | http://ir.siom.ac.cn/handle/181231/17973 |
Collection | 高密度光存储技术实验室 |
Affiliation | 1.刘波, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. 2.阮昊, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. 3.干福熹, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. |
Recommended Citation GB/T 7714 | 刘波,阮昊,干福熹. 光盘反射层纳米Al膜性能研究[J]. 光电子·激光,2002,13(10):987. |
APA | 刘波,阮昊,&干福熹.(2002).光盘反射层纳米Al膜性能研究.光电子·激光,13(10),987. |
MLA | 刘波,et al."光盘反射层纳米Al膜性能研究".光电子·激光 13.10(2002):987. |
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光盘反射层纳米Al膜性能研究.pdf(188KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | Application Full Text |
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