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Alternative TitleThe Characteristics of Al Nano-films Used as Optical Disk Reflective Layer
刘波; 阮昊; 干福熹
Source Publication光电子·激光
Other AbstractThe characteristics of Al nano-film were studied by using AFM and spectroscopic ellipsometer methods. It was indicated that the surface roughness of sputtered Al nano-film, from 1.216 nm (rms) at 0.4 Pa to 3.521 nm at 1.6 Pa, is proportional to the sputtering Ar pressure. The refractive index, extinction coefficient and reflectivity of Al nano-film all decrease as the sputtering Ar pressure increases. The above phenomenon is related to the change of Al nano-film structure. In most cases, the reflectivity of Al nano-film is more than 85%. It was also indicated that the surface roughness of sputtered Al nano-film increases when the sputtering power increases, from 0.486 nm at 1000 W changing to 2.014 nm at 2500 W. However the optical constants of Al nano-film are not sensitive to the sputtering power.
Funding Organization国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 ; 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目
Indexed ByCSCD
Funding Organization国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目 ; 国家自然科学基金资助项目(5983060) ; 上海应用物理中心资助项目
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Document Type期刊论文
Affiliation1.刘波, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
2.阮昊, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
3.干福熹, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
Recommended Citation
GB/T 7714
刘波,阮昊,干福熹. 光盘反射层纳米Al膜性能研究[J]. 光电子·激光,2002,13(10):987.
APA 刘波,阮昊,&干福熹.(2002).光盘反射层纳米Al膜性能研究.光电子·激光,13(10),987.
MLA 刘波,et al."光盘反射层纳米Al膜性能研究".光电子·激光 13.10(2002):987.
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光盘反射层纳米Al膜性能研究.pdf(188KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
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