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Alternative TitleStudy on Manufacturing Highly Oriented (111)PbTiO_3 Thin Film and its Optical Properties
赵强; 褚君浩; 范正修
Source Publication压电与声光
Abstract单一取向铁电薄膜是大家长期以来研究的目标之一,文中采用组合靶射频溅射在白宝石(alpha-Al_2O_3)衬底上制备出具有较好的(111)择优取向的PbTiO_3薄膜。从薄膜的光学透射谱计算所得的折射率和波长的关系能够较好地符合单振子模型,由此得出了薄膜在400~2 400 nm区域的折射率变化,在长波极限时薄膜的折射率为2.51。
Other AbstractHighly oriented (111)PbTiO_3 thin film with pervoskite type microstructure was synthesized directly on the alpha-Al_2O_3 substrate using a rf-magnetron sputtering system with a composite target. The relation between refractive index and wavelength, calculated from the transmittance spectrum of the film, fits the individual dipole oscillator model very well. Thus, the dispersion property from 400 nm to 2 400 nm could be calculated, and the minimum refractive index of the film is 2.51.
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Document Type期刊论文
Affiliation1.赵强, 中国科学院上海技术物理所, 红外物理国家重点实验室, 上海 200083, 中国.
2.褚君浩, 中国科学院上海技术物理所, 红外物理国家重点实验室, 上海 200083, 中国.
3.范正修, 中国科学院上海光学精密机械研究所薄膜技术中心, 上海 200083, 中国.
Recommended Citation
GB/T 7714
赵强,褚君浩,范正修. 高度择优取向(111)PbTiO_3薄膜的制备及光学特性[J]. 压电与声光,2002,24(5):382.
APA 赵强,褚君浩,&范正修.(2002).高度择优取向(111)PbTiO_3薄膜的制备及光学特性.压电与声光,24(5),382.
MLA 赵强,et al."高度择优取向(111)PbTiO_3薄膜的制备及光学特性".压电与声光 24.5(2002):382.
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