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Alternative TitleStudy on Metastable Neon Beam Source Used for Atom Lithography
霍芸生; 蔡惟泉; 曾庆林; 鄢和明; 王育竹
Source Publication中国激光
Abstract研制了一台用于原子光刻的亚稳态氖原子束源,其束流强度可达3.3 * 10~(14) atoms/s·Sr.。研究了束流强度的变化规律,并对其机理进行了探讨。
Other AbstractA neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3 * 10~(14) atoms/s·Sr was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.
Funding Organization国家自然科学基金(No.19774060) ; 国家自然科学基金(No.19774060)
Indexed ByEI
Funding Organization国家自然科学基金(No.19774060) ; 国家自然科学基金(No.19774060)
Document Type期刊论文
Affiliation1.霍芸生, 中国科学院上海光学精密机械研究所, 量子光学开放实验室, 上海 201800, 中国.
2.蔡惟泉, 中国科学院上海光学精密机械研究所, 量子光学开放实验室, 上海 201800, 中国.
3.曾庆林, 中国科学院上海光学精密机械研究所, 量子光学开放实验室, 上海 201800, 中国.
4.鄢和明, 中国科学院上海光学精密机械研究所, 量子光学开放实验室, 上海 201800, 中国.
5.王育竹, 中国科学院上海光学精密机械研究所, 量子光学开放实验室, 上海 201800, 中国.
Recommended Citation
GB/T 7714
霍芸生,蔡惟泉,曾庆林,等. 原子光刻用亚稳态氖原子束源的研究[J]. 中国激光,2002,29(1):40.
APA 霍芸生,蔡惟泉,曾庆林,鄢和明,&王育竹.(2002).原子光刻用亚稳态氖原子束源的研究.中国激光,29(1),40.
MLA 霍芸生,et al."原子光刻用亚稳态氖原子束源的研究".中国激光 29.1(2002):40.
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