SIOM OpenIR  > 光学薄膜技术研究与发展中心
大面积均匀纳米金刚石薄膜制备研究
Alternative TitleSynthesis of Uniform and Large Area Nano-Diamond Film
龚辉; 范正修; 姜辛
2002
Source Publication光学学报
Volume22Issue:6Pages:718
Abstract报道了一种利用偏压恒流等离子辅助热丝化学气相沉积方法在硅基板上制备大面积均匀纳米金刚石薄膜的新工艺,在不同沉积条件下研究了纳米金刚石薄膜的成核和生长过程,并通过扫描电镜、拉曼光谱和表面粗糙度测试仪观察了纳米金刚石薄膜的结构特征。最后成功制备了直径100 mm、平均晶粒尺寸10 nm的光滑纳米金刚石薄膜。
SubtypeArticle
Other AbstractA new process is presented for preparing uniform and large-area nano-diamond film on Si substrates using a bias assisted and constant-current controlled hot filament chemical vapor deposition. The nucleation and growth of nano-diamond films under different parameters were investigated. The nano-diamond films were measured by scan electron microscope (SEM), Raman spectroscopy and surface roughness measurement system. The smooth nano-diamond film with diameter 100 mm and average particle size of 10 nm was prepared.
Funding Organization中国科学院和德国夫琅和费研究交流项目 ; 中国科学院和德国夫琅和费研究交流项目
Indexed ByEI
Language中文
Funding Organization中国科学院和德国夫琅和费研究交流项目 ; 中国科学院和德国夫琅和费研究交流项目
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/17859
Collection光学薄膜技术研究与发展中心
Affiliation1.龚辉, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
2.范正修, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
3.姜辛, Fraunhofer-IST of Film and Surface Engineering, 德国.
Recommended Citation
GB/T 7714
龚辉,范正修,姜辛. 大面积均匀纳米金刚石薄膜制备研究[J]. 光学学报,2002,22(6):718.
APA 龚辉,范正修,&姜辛.(2002).大面积均匀纳米金刚石薄膜制备研究.光学学报,22(6),718.
MLA 龚辉,et al."大面积均匀纳米金刚石薄膜制备研究".光学学报 22.6(2002):718.
Files in This Item:
File Name/Size DocType Version Access License
V22-6-718.pdf(221KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[龚辉]'s Articles
[范正修]'s Articles
[姜辛]'s Articles
Baidu academic
Similar articles in Baidu academic
[龚辉]'s Articles
[范正修]'s Articles
[姜辛]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[龚辉]'s Articles
[范正修]'s Articles
[姜辛]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.