SIOM OpenIR  > 光学薄膜技术研究与发展中心
溅射功率对多层膜质量的影响
Alternative TitleInfluence of Sputtering Power on Optical Quality of Thin Film
冯仕猛; 赵海鹰; 窦晓鸣; 范正修; 邵建达
2002
Source Publication光学学报
Volume22Issue:11Pages:1300
Abstract用磁控溅射技术制备薄膜,用X射线衍射研究在基片和靶间距离固定的情况下不同的溅射功率对薄膜结构的影响。结果表明:过低的溅射功率下淀积的薄膜有畸变的X射线衍射特征峰,特征峰强度小,半峰全宽大。而比较高溅射功率得到的薄膜有比较尖锐的X射线衍射特征峰,强度高和半峰全宽非常窄。研究表明,X射线衍射特征峰强度小和半峰全宽大的薄膜结构疏松,而强度高和半峰全宽非常窄的薄膜结构致密。
SubtypeArticle
Other AbstractThe thin films were fabricated by varying the magnetron sputtering power in order to investigate the influence of the sputtering power on the structure of thin films. The results show that the thin film deposited at very low power has the distorted XRD characteristic peaks with low intensity and the large width of half peak, while the films deposited at high power show the sharp characteristic peak. The related investigations illustrate that the thin film deposited with low power has the loose structure, and that with high power has coherent structure.
Indexed ByEI
Language中文
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/17836
Collection光学薄膜技术研究与发展中心
Affiliation1.冯仕猛, 上海交通大学物理系, 上海 200240, 中国.
2.赵海鹰, 上海交通大学物理系, 上海 200240, 中国.
3.窦晓鸣, 上海交通大学物理系, 上海 200240, 中国.
4.范正修, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
5.邵建达, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
Recommended Citation
GB/T 7714
冯仕猛,赵海鹰,窦晓鸣,等. 溅射功率对多层膜质量的影响[J]. 光学学报,2002,22(11):1300.
APA 冯仕猛,赵海鹰,窦晓鸣,范正修,&邵建达.(2002).溅射功率对多层膜质量的影响.光学学报,22(11),1300.
MLA 冯仕猛,et al."溅射功率对多层膜质量的影响".光学学报 22.11(2002):1300.
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