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Alternative TitleInfluence of Sputtering Power on Optical Quality of Thin Film
冯仕猛; 赵海鹰; 窦晓鸣; 范正修; 邵建达
Source Publication光学学报
Other AbstractThe thin films were fabricated by varying the magnetron sputtering power in order to investigate the influence of the sputtering power on the structure of thin films. The results show that the thin film deposited at very low power has the distorted XRD characteristic peaks with low intensity and the large width of half peak, while the films deposited at high power show the sharp characteristic peak. The related investigations illustrate that the thin film deposited with low power has the loose structure, and that with high power has coherent structure.
Indexed ByEI
Document Type期刊论文
Affiliation1.冯仕猛, 上海交通大学物理系, 上海 200240, 中国.
2.赵海鹰, 上海交通大学物理系, 上海 200240, 中国.
3.窦晓鸣, 上海交通大学物理系, 上海 200240, 中国.
4.范正修, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
5.邵建达, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
Recommended Citation
GB/T 7714
冯仕猛,赵海鹰,窦晓鸣,等. 溅射功率对多层膜质量的影响[J]. 光学学报,2002,22(11):1300.
APA 冯仕猛,赵海鹰,窦晓鸣,范正修,&邵建达.(2002).溅射功率对多层膜质量的影响.光学学报,22(11),1300.
MLA 冯仕猛,et al."溅射功率对多层膜质量的影响".光学学报 22.11(2002):1300.
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V22-11-1300.pdf(75KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
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