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Threshold of femtosecond laser-induced damage in transparent materials
Jia, TQ; Li, RX; Liu, Z; Xu, ZZ; Jia, TQ (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Intens Opt, POB 800-211, Shanghai 201800, Peoples R China.
2002
Source PublicationAppl. Phys. A-Mater. Sci. Process.
Volume74Issue:4Pages:503
AbstractThe rate at which conduction-band electrons (CBE) absorb laser energy is calculated by both the quantum mechanical and the classical methods. Here fused silica irradiated with a 780-nm femtosecond-pulse laser is used as an example. It is found that the rate obtained by the quantum mechanical method is about one-third of that by the classical method, and it is much less than the direct-current limit. In the flux-doubling model, the avalanche rate in fused silica is 4 I ps(-1) obtained by the quantum mechanical method, while it is about 13.7 Ips(-1) by the classical method, where the laser intensity I is in units of TWcm(-2). The differential equation of the evolution of CBE density is solved numerically, and it is found that the combination of CBE hole recombination, CBE diffusion and initial CBE density (< 10(13) cm(-3)) is not important. The dependence of avalanche breakdown threshold on laser-pulse duration is presented. The threshold calculated by the quantum mechanical method agrees well with experimental results, while the threshold obtained by the classical method differs greatly from the experiments.
SubtypeArticle
DOI10.1007/s003390100903
Indexed BySCI
Language英语
WOS IDWOS:000174673300009
Citation statistics
Cited Times:15[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/17733
Collection强场激光物理国家重点实验室
Corresponding AuthorJia, TQ (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Intens Opt, POB 800-211, Shanghai 201800, Peoples R China.
AffiliationChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Intens Opt, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Jia, TQ,Li, RX,Liu, Z,et al. Threshold of femtosecond laser-induced damage in transparent materials[J]. Appl. Phys. A-Mater. Sci. Process.,2002,74(4):503.
APA Jia, TQ,Li, RX,Liu, Z,Xu, ZZ,&Jia, TQ .(2002).Threshold of femtosecond laser-induced damage in transparent materials.Appl. Phys. A-Mater. Sci. Process.,74(4),503.
MLA Jia, TQ,et al."Threshold of femtosecond laser-induced damage in transparent materials".Appl. Phys. A-Mater. Sci. Process. 74.4(2002):503.
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