SIOM OpenIR  > 高密度光存储技术实验室
Optimization of two-monomer-based photopolymer used for holographic recording
Yao, HW; Huang, MJ; Chen, ZY; Hou, LS; Gan, FX; Yao, HW (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China.
2002
Source PublicationMater. Lett.
Volume56Issue:1_2Pages:3
AbstractStudies of optimization and characteristics of a dry film photopolymerizable recording material are presented. The effect of variation of the concentration of each component was investigated. Diffraction efficiencies of 55%, with the energetic sensitivity of 60 mJ/cm(2), have been obtained in the photosensitive films of 150-mum thickness with a spatial frequency of 2750 lines/mm. An image has been successfully stored in the material with a small distortion. (C) 2002 Elsevier Science B.V. All rights reserved.
SubtypeArticle
DOI10.1016/S0167-577X(02)00406-8
Indexed BySCI
Language英语
WOS IDWOS:000178527600002
Citation statistics
Document Type期刊论文
Version出版稿
Identifierhttp://ir.siom.ac.cn/handle/181231/17690
Collection高密度光存储技术实验室
Corresponding AuthorYao, HW (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China.
AffiliationChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Yao, HW,Huang, MJ,Chen, ZY,et al. Optimization of two-monomer-based photopolymer used for holographic recording[J]. Mater. Lett.,2002,56(1_2):3.
APA Yao, HW,Huang, MJ,Chen, ZY,Hou, LS,Gan, FX,&Yao, HW .(2002).Optimization of two-monomer-based photopolymer used for holographic recording.Mater. Lett.,56(1_2),3.
MLA Yao, HW,et al."Optimization of two-monomer-based photopolymer used for holographic recording".Mater. Lett. 56.1_2(2002):3.
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