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题名:
用于光刻机照明均匀化的微柱面镜阵列设计
其他题名: Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems
作者: 肖艳芬; 朱菁; 杨宝喜; 胡中华; 曾爱军; 黄惠杰
通讯作者: 肖艳芬, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. ; 朱菁, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. ; 杨宝喜, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. ; 胡中华, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. ; 曾爱军, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. ; 黄惠杰, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
刊名: 中国激光
发表日期: 2013
卷: 40, 期:2, 页:216001
文章类型: Article
收录类别: EI
摘要: 均匀照明是投影光刻机中实现光刻线条高度均一性的重要条件。采用微透镜阵列作为照明匀光器件,能够在实现矩形照明光斑的同时获得极高的远场分布均匀性。基于微透镜阵列现有的加工工艺,设计出二维方向分开的柱面微透镜阵列,并通过优化设计,克服了微透镜之间的接缝在远场光场处产生的中心亮线。仿真分析表明,所设计的微透镜阵列的远场分布不均匀性达到0.85%。
英文摘要: Uniform illumination is an important condition for maintaining high uniformization consistence of lithography lines in projection lithography. Micro-lens array used as the illumination uniformization component can make the rectangular illumination spot as well as acquire high far field uniformization. Based on modern processing technology, the cylindrical micro-lens array divided in two-dimension is designed, and the central bright line in the far field created by the transition area between the micro-lens array is eliminated. Simulation results show that the far field non-uniformi of the designed micro-lens array reaches 0.85%.
语种: 中文
项目资助者: 国家科技重大专项 ; 国家国际科技合作项目
内容类型: 期刊论文
版本: 出版稿
URI标识: http://ir.siom.ac.cn/handle/181231/14936
Appears in Collections:信息光学与光电技术实验室_期刊论文

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作者单位: 1.Xiao Yanfen, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.
2.Zhu Jing, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.
3.Yang Baoxi, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.
4.Hu Zhonghua, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.
5.Zeng Aijun, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.
6.Huang Huijie, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China.

Recommended Citation:
肖艳芬,朱菁,杨宝喜,等. 用于光刻机照明均匀化的微柱面镜阵列设计[J]. 中国激光,2013,40(2):216001.
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